FOT

Lithography legal system as a high Q value light nano resonator

by:FOT     2020-07-15
Lithography legal system as a high Q value light nano resonator

lithography legal system as a high Q value light nano resonator

takeaway: nano resonator using silicon photonic crystal light strong light can be sealed in a small area, depend on this characteristic, can be applied to a silicon laser, optical storage and medical diagnose sensor etc. Especially in recent years the importance of ultra-low power consumption category, a silicon Raman laser light nano resonator with more than 1 million Q is considered to be indispensable.

Osaka prefecture university and Japan's industrial technology research institute ( Production of research) On March 16, 2016, apply for industry produce of photolithography, successfully created the Q value ( The goal of shows that the strength of the light seal) The light of the more than 1 million nano resonator. This effect made it possible to volume production of silicon photonic crystal components, is expected to invent new photon industry.

nano resonator using silicon photonic crystal light strong light can be sealed in small area, depend on this characteristic, can be applied to a silicon laser, optical storage and medical diagnose sensor etc. Especially in recent years the importance of ultra-low power consumption category, a silicon Raman laser light nano resonator with more than 1 million Q is considered to be indispensable.

Q value reached more than 1 million nano resonator always choose light beam lithography legal system is not suitable for a large number of the produce. To real industrial use of nowadays, we must use common photolithography in semiconductor production in large areas of uniform on wafer production. Photolithography despite having 1 million times electron beam lithography produces power, but in terms of fine pictures form accuracy is poorer, once Q value can reach 200000.

this time, in the production of research super clean room ( 可控硅) Silicon components trial one-stop production line, using the best ArF immersion lithography method and a line of technical personnel of technical experience, to 30 cm in diameter of silicon wafers made on the surface of high precision optical nano resonator. Inspection on multiple samples of the results showed that can get even more than 1. 5 million, 2 million Q value. , optimized the structure of the resonator, it could also get higher Q value.

in addition to the high Q value light nano resonator, in solar cell silicon photonic crystals, thermal radiation light source and the use of the category of thermoelectric power generation development is lively. And, after a further study on the effect, also is expected to be used in other categories according to the volume production of photoetching technique.

Custom message
Chat Online
Chat Online
Chat Online inputting...