In the emission spectrum, LED fiber optic spectrometer, film thickness measurement applications

by:FOT     2020-07-09
Fiber optic spectrometer is the main part of optical instruments. Due to its advantages of high accuracy, high speed, has become an important measure to spectrum used in the surveying instrument is widely used in agriculture, biology, chemistry, geology, food safety, chromaticity calculation, environmental inspection, medicine and health care, LED, semiconductor industry, petrochemical industry, etc. 1, the emission spectrum emission spectrum measurement can use different experimental layout and wavelength range, to use the cosine corrector or integrating sphere. Emission spectrum measurement in the uv/visible and visible/near infrared wavelength range measurement. For emission spectrum measurements, spectrometer can be configured to wavelength range from 200 Nm or 350-400 1100 nm, or combined ultraviolet/visible - 200 1100nm。 In order to make the experiment more flexible layout, using visible/near-infrared calibration source ( LS - 1 - CAL) Or ultraviolet/visible/near-infrared calibration source ( DH2000 - CAL) Can be scaling at the scene of the user. Powerful guangzhou standard software can complete calibration and load the radiation calibration data. 2, LED a simple and fast measurement of the luminous flux of LED is to use an integrating sphere, and connects it to a company United States ocean optics spectrometer. The system can use halogen lamps for scaling ( LS - 1 - CAL- INT) Guangzhou, and then use standard software from measurement to calculate the related parameters of the distribution of spectrum and implement radiation measurement. The metering source spectral luminous intensity can also use & mu; W/cm2 / nm to calculate, display and storage. Window also can display about ten parameters: radiation & mu; W/cm2, μ J/cm2, μ W or & mu; J; Luminous flux lux or lumen, color axis X, Y, Z, X, Y, Z, u, v and color temperature. 3, film thickness measurement of optical film thickness measurement system based on white light interferometry principle, 10 nm - membrane thickness can be measured 50μ M, a resolution of 1 nm. Film measurement is often used in the semiconductor wafer growth process, because the plasma etching and deposition process, the need to monitor Other applications such as metal and glass substrate transparent optical film plating layers also need to measure film thickness.
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